发明名称 |
APPARATUS AND PROCESS FOR PLASMA DISCHARGE TREATMENT, THIN FILM AND LAMINATE MANUFACTURED BY THE PROCESS, OPTICAL FILM, AND POLARIZER AND IMAGE DISPLAY DEVICE USING THE OPTICAL FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus for manufacturing a thin film with high productivity capable of continuously treating wide base materials at high speed dispensing with a vacuum unit and high temperature treatment, and even when an inexpensive and safe reactive gas such as nitrogen is used, a method for forming a multilayer laminate of a uniform thin film, an optical film of the thin film laminate formed by the method, and a polarizer and an image display device using the optical film. SOLUTION: This invention is a plasma discharge treatment apparatus equipped with a pair of opposing electrodes consisting of a first and a second electrodes and a discharge section. In the discharge section, a base material treated while passing a side closer to one electrode of the opposing electrodes is carried to the discharge section while passing again a side closer to the other electrode. A means is provided for supplying a reacting gas of atmospheric or nearly atmospheric pressure between the base materials reciprocatingly passing in the discharge section and high-frequency voltage components differing from each other are applied to the first and the second electrodes, respectively. COPYRIGHT: (C)2004,JPO&NCIPI |
申请公布号 |
JP2004189958(A) |
申请公布日期 |
2004.07.08 |
申请号 |
JP20020361847 |
申请日期 |
2002.12.13 |
申请人 |
KONICA MINOLTA HOLDINGS INC |
发明人 |
MURAKAMI TAKASHI;FUKUDA KAZUHIRO |
分类号 |
C08J7/00;(IPC1-7):C08J7/00 |
主分类号 |
C08J7/00 |
代理机构 |
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代理人 |
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