发明名称 APPARATUS AND PROCESS FOR PLASMA DISCHARGE TREATMENT, THIN FILM AND LAMINATE MANUFACTURED BY THE PROCESS, OPTICAL FILM, AND POLARIZER AND IMAGE DISPLAY DEVICE USING THE OPTICAL FILM
摘要 PROBLEM TO BE SOLVED: To provide an apparatus for manufacturing a thin film with high productivity capable of continuously treating wide base materials at high speed dispensing with a vacuum unit and high temperature treatment, and even when an inexpensive and safe reactive gas such as nitrogen is used, a method for forming a multilayer laminate of a uniform thin film, an optical film of the thin film laminate formed by the method, and a polarizer and an image display device using the optical film. SOLUTION: This invention is a plasma discharge treatment apparatus equipped with a pair of opposing electrodes consisting of a first and a second electrodes and a discharge section. In the discharge section, a base material treated while passing a side closer to one electrode of the opposing electrodes is carried to the discharge section while passing again a side closer to the other electrode. A means is provided for supplying a reacting gas of atmospheric or nearly atmospheric pressure between the base materials reciprocatingly passing in the discharge section and high-frequency voltage components differing from each other are applied to the first and the second electrodes, respectively. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004189958(A) 申请公布日期 2004.07.08
申请号 JP20020361847 申请日期 2002.12.13
申请人 KONICA MINOLTA HOLDINGS INC 发明人 MURAKAMI TAKASHI;FUKUDA KAZUHIRO
分类号 C08J7/00;(IPC1-7):C08J7/00 主分类号 C08J7/00
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