发明名称 Lithographic apparatus, optical element and device manufacturing method
摘要 An optical element, such as a multi-layer mirror for an EUV lithography apparatus, is provided, the optical element having a layer comprising one or more Buckminsterfullerenes. Typically the fullerenes are present as a capping layer, which is either provided as the outer capping layer of the optical element or forms a sub-capping layer which is adjacent to an outer capping layer formed of a different material. The fullerene containing layer(s) may alternatively or additionally be present as an interlayer between two layers of a multi-layer mirror.
申请公布号 US2004130693(A1) 申请公布日期 2004.07.08
申请号 US20030691969 申请日期 2003.10.24
申请人 ASML NETHERLANDS B.V. 发明人 KURT RALPH
分类号 G21K1/06;G03F7/20;G21K5/02;H01L21/027;(IPC1-7):G03B27/54 主分类号 G21K1/06
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