INSPECTION METHOD FOR MASK PATTERN, INSPECTING APPARATUS, AND INSPECTION DATA AND METHOD FOR PRODUCING INSPECTION DATA TO BE USED THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide an inspection method for a photomask by which the TAT (turn-around-time) can be decreased and the cost can be reduced.

SOLUTION: The method for inspecting a photomask for a semiconductor integrated circuit formed based on the data for drawing patterns includes: a process of classifying the drawing patterns of the semiconductor integrated circuit into a plurality of ranks according to prescribed references of features and extracting; and a process of determining the inspection accuracy for each rank and judging the quality of the photomask depending on whether the extracted pattern satisfies the determined inspection accuracy or not.

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