| 摘要 |
PURPOSE: A method for forming a contact hole is provided to obtain the same contact resistance by forming equally contact areas between two contact holes having different depth and two objects. CONSTITUTION: The first and the second contact holes(120,130) are formed on an insulating material layer(100). The first and the second contact holes include an entrance and a bottom, respectively. The width of the entrance of the first and the second contact holes is narrower than the width of the bottom of the first and the second contact holes. A diameter of the entrance of the first contact hole is different from the diameter of the entrance of the first contact hole. A diameter of the bottom of the first contact hole is equal to the diameter of the bottom of the second contact hole.
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