APPARATUS AND METHOD FOR MONITORING MASK PATTERN

摘要

PURPOSE: An apparatus and method for monitoring a mask pattern are provided to prevent the reduction of semiconductor yield due to deformation of the mask pattern by monitoring deformation degree. CONSTITUTION: A mask pattern(105) is used for forming a pattern in an exposure. A monitoring mark(105a) is inserted in the mask pattern. An apparatus for monitoring the mask pattern includes a light source(102) for generating monitoring light, a reticle stage(104) loaded with the mask pattern, a measurement part(106) and a microcomputer(108). The measurement part is used for measuring a distance value of the mark by using a signal obtained from a mark scanning process. The microcomputer is used for stopping the exposure when the second distance value is different from the first distance value.