BATH STRUCTURE OF SEMICONDUCTOR EQUIPMENT

摘要

PURPOSE: A bath structure of a semiconductor equipment is provided to reduce the usage of chemicals and to easily flow the chemical by reducing the volume of the bath. CONSTITUTION: A bath structure includes an inner bath(10a) for loading a wafer(W) and cleaning the wafer(W) and an outer bath(10b) to inflow the over-flow chemicals from the inner bath. At this time, the lower part of the inner bath has a semicircular shape in order to reduce the volume of the inner bath.