| 摘要 |
PURPOSE: An inductor monitoring pattern and a method for manufacturing the same are provided to improve the reliability of monitoring by using inductor monitoring patterns with different line-width. CONSTITUTION: For monitoring a plurality of inductors on a semiconductor wafer, an inductor monitoring pattern is provided with a metal interconnection having same width to a desired inductor that every time the wafer rotates to 0.5 or one time. Preferably, the metal interconnection has a coil spring shape with different line-width.
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