| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a photomask for forming a pattern of fine electric wiring on the surface of an object having a three-dimensional structure. <P>SOLUTION: A sheet 1d made of a thermoplastic synthetic resin is disposed as preheated on a three-dimensional molded article 1c as a core, upper and lower molds 1a, 1b are moved nearer, and air is sucked by a vacuum source 8 to produce a photomask body 4 by a vacuum molding method. A metal film 15 made of a light shielding material such as Cr is formed on the outer face of the photomask body 4 and etched by forming fine openings by a photolithographic method to form a pattern layer 5 to manufacture a photomask 3. The obtained photomask 3 is applied tightly in contact with an object 6 such as a molded product and subjected to exposure to selectively expose a photosensitive resist layer on the object 6. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p> |
