发明名称 PLATING METHOD, PLATING APPARATUS, AND PRODUCTION METHOD FOR ELECTRONIC DEVICE
摘要 PROBLEM TO BE SOLVED: To form wiring having high reliability by electroplating, and to improve the yield in device production thereby. SOLUTION: The face to be plated in a substrate 100 is dipped into a plating liquid 111 stored in a plating treatment tank 110 in an overflow state so that the face to be plated lies downward, and further, the contact between the non-plated part in the substrate 100 and the plating liquid 111 is prevented by using a seal part 103, so that the substrate 100 is subjected to plating treatment. Thereafter, at least the seal part 103 is cleaned with pure water by using a cleaning mechanism 150, so that the plating liquid 111 stuck to the seal part 103 is removed. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004183042(A) 申请公布日期 2004.07.02
申请号 JP20020350815 申请日期 2002.12.03
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 HIRAO HIDEJI
分类号 C25D7/12;C25D5/02;C25D21/08;H01L21/288;(IPC1-7):C25D7/12 主分类号 C25D7/12
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