HEAT TREATMENT APPARATUS FOR SEMICONDUCTOR WAFER,申请号JP19890147241-传众专利搜索

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发明名称	HEAT TREATMENT APPARATUS FOR SEMICONDUCTOR WAFER
摘要
申请公布号	JPH0311621(A)	申请公布日期	1991.01.18
申请号	JP19890147241	申请日期	1989.06.08
申请人	NEC CORP	发明人	ISHITANI SHIGERU
分类号	H01L21/205;H01L21/22;H01L21/31	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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