MASK HAVING EASILY FORMED ION INJECTION AREA AND METHOD FOR MANUFACTURING THE SAME AND SEMICONDUCTOR DEVICE USING THE SAME

摘要

PURPOSE: A mask and a method for manufacturing the same and a semiconductor device using the same are provided to facilitate a formation of an ion injection area without performing a resist pattern forming process, a pattern exposure process, and a resist pattern peeling process. CONSTITUTION: A mask includes a plate-like member(1) having a mask pattern area and a pn junction, and a current supplying portion(6,6N,6P) supplying a current to the pn junction. A current is fed to the pn junction, thereby causing a Peltier effect and controlling a temperature of the mask pattern area. The mask pattern area is a stencil mask for ion implantation in which ions are allowed to be passed through openings thereof. The mask pattern area is configured to function as a cooling surface due to the Peltier effect.