发明名称 |
PELLICLE FOR FLUORINE GAS EXCIMER LASER AND MANUFACTURING METHOD THEREOF |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a pellicle for maintaining a high transmittancy and avoiding a damage of a pellicle film. <P>SOLUTION: A pellicle for fluorine excimer laser is composed of the pellicle film and a pellicle frame comprising a fluorine-containing polymer. This pellicle sets a tension (a) by thermomechanical analysis of the pellicle film at≤4.0×10<SP>-5</SP>N/μm<SP>2</SP>. Wherein, the tension (a) is defined by detecting a value of a force applied to a probe to be an absolute value of force/displacement as tension of the pellicle film and normalizing the absolute value by a thickness (μm) of the pellicle film, when setting an initial sample mounted weighing at 1.96×10<SP>-3</SP>N and setting a diameter of the probe contacted with the pellicle film surface at 4.9 mm and changing the thickness of the pellicle film from 0μm to -200μm at a speed of 100μm/min, by using a program displacement of the thermomechanical analysis at a central portion of the pellicle film pitched on a circular frame body with an inner diameter of 20 mm. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p> |
申请公布号 |
JP2004184705(A) |
申请公布日期 |
2004.07.02 |
申请号 |
JP20020351691 |
申请日期 |
2002.12.03 |
申请人 |
SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC;ASAHI GLASS CO LTD |
发明人 |
MATSUKURA IKUO;SHIROTA NAOKO;OKI SATOSHI;SASAKI HIRONAO;TOKAWA IWAO |
分类号 |
G03F1/62;H01L21/027;(IPC1-7):G03F1/14 |
主分类号 |
G03F1/62 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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