发明名称 METHOD FOR REINFORCING THICKNESS OF NITRIDE THIN FILM
摘要 PURPOSE: A method for reinforcing the thickness of a nitride thin film is provided to improve sensitivity and strength by effectively intensifying weak portion alone of the nitride thin film using the stress distribution of the nitride thin film. CONSTITUTION: A stress distribution of a nitride thin film is obtained by carrying out a structure analysis. A weak portion of the nitride thin film is checked by using the stress distribution. The thickness of the weak portion is intensified by carrying out an etching process. The entire thickness of the nitride thin film and the thickness for reinforcement are decided by reducing the thickness for the entire nitride thin film and simultaneously controlling reinforcement thickness according to stress.
申请公布号 KR20040057119(A) 申请公布日期 2004.07.02
申请号 KR20020083572 申请日期 2002.12.24
申请人 RESEARCH INSTITUTE OF INDUSTRIAL SCIENCE & TECHNOLOGY, INCORPORATED FOUNDATION 发明人 KIM, IN CHEOL;YOON, MIN SU
分类号 H01L21/318;(IPC1-7):H01L21/318 主分类号 H01L21/318
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