<p>A method for annealing a film, such as a ferroelectric or magnetic film is described. The method comprises the steps of (i) taking a film carried on a temperature sensitive substrate, the film having a radiation absorbing structure formed thereon, and (ii) illuminating the radiation absorbing structure with radiation produced by a laser. The radiation absorbing structure is heated sufficiently by the radiation to anneal all or some of the film without exceeding the temperature budget of the temperature sensitive substrate.</p>
申请公布号
WO2004055880(A1)
申请公布日期
2004.07.01
申请号
WO2003GB05499
申请日期
2003.12.16
申请人
QINETIQ LIMITED;DONOHUE, PAUL, PETER;ANTHONY, CARL, JOHN;TODD, MICHAEL, ANDREW
发明人
DONOHUE, PAUL, PETER;ANTHONY, CARL, JOHN;TODD, MICHAEL, ANDREW