发明名称 Ferroelectric memory devices with expanded plate line and methods of fabricating the same
摘要 A ferroelectric memory device includes a lower interlayer dielectric on a semiconductor substrate, a plurality of ferroelectric capacitors, and a plate line. The ferroelectric capacitors are on the lower interlayer dielectric. The plate line extends across and electrically connects to surfaces of at least two adjacent ones of the plurality of ferroelectric capacitors.
申请公布号 US2004124455(A1) 申请公布日期 2004.07.01
申请号 US20030624327 申请日期 2003.07.22
申请人 LEE KYU-MANN;NAM SANG-DON;PARK KUN-SANG 发明人 LEE KYU-MANN;NAM SANG-DON;PARK KUN-SANG
分类号 H01L27/105;H01L21/768;H01L21/8246;H01L27/115;H01L29/76;(IPC1-7):H01L29/76 主分类号 H01L27/105
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