发明名称 |
COLOR FILTER BLACK MATRIX RESIST COMPOSITION AND CARBON BLACK DISPERSION COMPOSITION USED FOR THE COMPOSITION |
摘要 |
The present invention provides a carbon black dispersion composition for a color filter black matrix resist composition, containing (A) a carbon black having specified physical properties (average primary particle diameter, concentration of surface carboxyl groups), (B) a copolymer having an amino group and/or its quaternary ammonium salt, and (C) an organic solvent, and a color filter black matrix resist composition that contains the above-mentioned dispersion composition, (D) a binder resin having a carboxyl group, (E) an ethylenically unsaturated monomer, (F) a photopolymerization initiator, and (G) specified multifunctional thiol compound and can easily form a thin film or pattern having high light-shielding property by photolithographic method pattern, has excellent storage stability, and exhibits sufficient sensitivity and resolution. |
申请公布号 |
WO2004055597(A1) |
申请公布日期 |
2004.07.01 |
申请号 |
WO2003JP16174 |
申请日期 |
2003.12.17 |
申请人 |
SHOWA DENKO K. K.;KAMATA, HIROTOSHI;KAMIJO, MASANAO;ONISHI, MINA |
发明人 |
KAMATA, HIROTOSHI;KAMIJO, MASANAO;ONISHI, MINA |
分类号 |
G02B5/20;C09C1/56;C09C3/10;C09D17/00;G02F1/1335;G03F7/00;G03F7/004 |
主分类号 |
G02B5/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|