发明名称 Method for manufacturing a semiconductor device having multiple laminated layers of different materials
摘要 A semiconductor device manufacturing method comprises a step of forming a laminated structure by adhering, on a semiconductor substrate including a plurality of integrated circuits, a carrier member covering a region in which the plurality of integrated circuits are formed, with an insulating resin interposed between the semiconductor substrate and the carrier member, a step of cutting a notch into the laminated structure so as to cut the semiconductor substrate together with the insulating resin while allowing at least a portion of the carrier member to remain uncut, and a dicing step for dividing the laminated structure by cutting the carrier member. The notch cutting step is performed while cooling a dicing saw used to cut the semiconductor substrate.
申请公布号 US2004121562(A1) 申请公布日期 2004.06.24
申请号 US20030714497 申请日期 2003.11.14
申请人 SANYO ELECTRIC CO., LTD.;KANTO SANYO SEMICONDUCTORS CO., LTD. 发明人 WAKUI MOTOAKI;SASAKI KAORU;IMAI KENJI;SHINOGI HIROYUKI;NOMA TAKASHI
分类号 H01L23/12;H01L21/00;H01L21/301;H01L21/304;H01L21/44;H01L21/50;H01L21/56;H01L21/60;H01L21/78;H01L27/146;(IPC1-7):H01L21/44 主分类号 H01L23/12
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