| 摘要 |
The invention relates to a method for improving an optical imaging property of a projection lens (20) which is part of a microlithographic projection exposure system (10) with which a reticle (24) arranged in an object plane (22) of the projection lens (20) can be imaged through the projection lens (20) onto a light-sensitive surface (26) arranged in a focal plane (28). First, an immersion liquid (38) is introduced into an interstice (40) between the light-sensitive surface (26) and an end surface (42) of the projection lens (20) facing said surface (26). Then, the imaging property of the projection lens (20) is determined. The determined imaging property is compared with a desired imaging property. The temperature of the immersion liquid (38) is modified until the determined imaging property approximates the desired imaging property as closely as possible. The imaging properties of the projection lens (20) can be precisely influenced through the temperature-induced modification of the refractive index of the immersion liquid (38), which can for example be used for compensating for a spherical aberration of the projection lens (20). |
