| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus for measuring the linearity, and protrusions and recesses on a surface along a curve, having an accuracy level of a nanometer or subnanometer. SOLUTION: Shearing interference meters, having three points, are constituted by combining the two shearing interference meters using orthogonal two-frequency lasers as a light source, in such a manner that one luminous flux of one of the two meters coincides with one luminous flux of the other of the meters. The distance between the three points, i.e., the difference in two optical paths is measured, to simultaneously measure the protrusions and recesses of the surface measured and an error accompanying movement of the surface measured. COPYRIGHT: (C)2004,JPO
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