| 发明名称 |
BARRIER FILM INTEGRITY ON POROUS LOW K DIELECTRICS BY APPLICATION OF A HYDROCARBON PLASMA TREATMENT |
| 摘要 |
A method for treating a dielectric material using hydrocarbon plasma is described, which allows for thinner films of barrier material to be used to form a robust barrier.
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| 申请公布号 |
US2004121586(A1) |
申请公布日期 |
2004.06.24 |
| 申请号 |
US20020328838 |
申请日期 |
2002.12.23 |
| 申请人 |
ABELL THOMAS JOSEPH |
发明人 |
ABELL THOMAS JOSEPH |
| 分类号 |
H01L21/768;(IPC1-7):H01L21/476;H01L21/44 |
主分类号 |
H01L21/768 |
| 代理机构 |
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