| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an etching-durable photosensitive resin composition which can be exposed for patterning with a small quantity of exposure light, which prevents misalignment of the pattern, which has excellent stripping property without leaving an unnecessary resin, and which can prevents a metal plate from rust. <P>SOLUTION: The etching-durable photosensitive resin to be used for the photoetching process of a metal plate comprises: (A) a polyvinyl alcohol resin having 65 to 98 mol% saponification degree and 4 to 46 (mPa s) viscosity of a 4 mass% aqueous solution at 20°C; (B) a carboxyl group-containing water-soluble polymer having <20,000 (mPa s) viscosity of a 4 mass% aqueous solution at 20°C; and (C) an alkali bichromate photosensitivity imparting agent. <P>COPYRIGHT: (C)2004,JPO |
