| 发明名称 |
FLUORINE-CONTAINING ALICYCLIC UNSATURATED COMPOUND, POLYMER THEREOF, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE COMPOSITION |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymer useful as a chemical amplification resist for lithography using rays ≤190 nm wavelength, high in transparency to exposure light and excellent in substrate adhesion and dry etching resistance, and to provide a monomeric compound for the polymer. <P>SOLUTION: A fluorine-containing alicyclic unsaturated compound represented by general formula(1)( wherein, at least one of R<SP>1</SP>and R<SP>2</SP>is a fluorine atom or fluorinated alkyl group ) is provided. The polymer is obtained by polymerizing the compound or a polymeric precursor including the compound. <P>COPYRIGHT: (C)2004,JPO |
| 申请公布号 |
JP2004175721(A) |
申请公布日期 |
2004.06.24 |
| 申请号 |
JP20020343843 |
申请日期 |
2002.11.27 |
| 申请人 |
NEC CORP |
发明人 |
MAEDA KATSUMI;NAKANO KAICHIRO |
| 分类号 |
G03F7/039;C07C59/62;C07C69/734;C08F32/00;C08F34/00;C08G61/00;H01L21/027 |
主分类号 |
G03F7/039 |
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