发明名称 POSITIVE PHOTOSENSITIVE COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide an alkali-soluble positive photosensitive composition having sensitivity to laser light in an IR wavelength region and to provide a positive photosensitive composition featuring that: required and sufficient adhesiveness can be obtained by applying the composition under the condition of 25 to 60% humidity in a work room without requiring burning; the composition can be developed without producing a residue while keeping high sensitivity; the composition can be patterned with a sharp profile; and the obtained resist film is extremely hard and improved in scratch resistance for handling before development. <P>SOLUTION: The positive photosensitive composition comprises: an alkali-soluble organic polymer material having a phenolic hydroxyl group; a photo-thermal converting material which absorbs IR rays from an image exposure light source to convert into heat; and either of a vinylpyrrolidone/dimethylaminoethyl methacrylate copolymer or a vinylpyrrolidone/caprolactam/dimethylaminoethyl methacrylate terpolymer. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004177771(A) 申请公布日期 2004.06.24
申请号 JP20020345525 申请日期 2002.11.28
申请人 THINK LABORATORY CO LTD 发明人 SATO TSUTOMU
分类号 G03F7/004;G03F7/032 主分类号 G03F7/004
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