| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a laser annealing treatment apparatus capable of stabilizing a laser irradiating region, and to provide a method for using the same. <P>SOLUTION: The laser annealing treatment apparatus 200 comprises a chamber 204, a laser beam source 202, a gas distributing nozzle 222, an excimer laser, and a gas feeding device 220. The gas distributing nozzle 222 is arranged in the chamber 204. A laser beam 202a generated by the excimer laser is composed to pass through the gas distributing nozzle 222. The gas feeding device 220 is connected to the gas distributing nozzle 222 to supply gas jet to the laser irradiating region, and any contaminants are carried away from the laser irradiating region. <P>COPYRIGHT: (C)2004,JPO |
