| 摘要 |
PROBLEM TO BE SOLVED: To inspect the superposed status of an underlying pattern and a resist pattern highly accurately under a condition that the underlying mark is covered by a material film. SOLUTION: The superposition inspecting device is provided with means 16-17 for outputting signals with respect to images in a mark region by photographing the images of the mark region, wherein a first mark formed on a first layer and a second mark formed on a second layer are positioned, a position detecting means 19 for a false mark floated on the surface of the material film so as to cope with the position of the second mark and the first mark based on the position of an edge developed in the image of the mark region, means 19, 20 for estimating the deviated amount of positions between the false mark and the first mark, and a means 20 for operating the deviated amount of superposition between the first mark and the second mark based on the position of the mark region in a shot region. COPYRIGHT: (C)2004,JPO
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