APPARATUS FOR DEVELOPING PHOTORESIST LAYER

摘要

PURPOSE: An apparatus for developing a photoresist layer is provided to prevent a pattern failure on a wafer by restraining the rebound of a developer and a cleaning solution using an impact absorption part. CONSTITUTION: An apparatus for developing a photoresist layer is provided with a chuck(301) for stably loading a wafer and an upper cup assembly(321) around the chuck for preventing a developer from deviating to the outside. The apparatus further includes a lower cup assembly spaced apart from the upper cup assembly as much as a predetermined distance for forming a flow path(323) and an impact absorption part(324) on the inner wall of the upper cup assembly for preventing the rebound of the developer.