发明名称 |
Plasma processor and plasma processing method |
摘要 |
A radial antenna (30) for supplying an electromagnetic field into a processing vessel has slots (36) that are arranged along a spiral line having an interval d of approximately N times (N is a natural number) a wavelength lambdag of the electromagnetic field within the radial antenna (30). The electromagnetic field is fed from the center of the radial antenna (30) in a rotational mode.
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申请公布号 |
US2004112541(A1) |
申请公布日期 |
2004.06.17 |
申请号 |
US20030472247 |
申请日期 |
2003.09.22 |
申请人 |
ISHII NOBUO;ANDO MAKOTO;TAKAHASHI MASAHARU;YASAKA YASUYOSHI |
发明人 |
ISHII NOBUO;ANDO MAKOTO;TAKAHASHI MASAHARU;YASAKA YASUYOSHI |
分类号 |
H05H1/46;B01J19/08;H01J37/32;H01L21/302;H01L21/306;H01L21/3065;H01L21/31;(IPC1-7):H01L21/306 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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