Remote ICP torch for semiconductor processing

摘要

Chemical generators and methods are described for generating a desired chemical species at or near a point of use such as the chamber of a reactor in which a workpiece such as a semiconductor wafer is to be processed. The chemical species is generated by dissociating precursor materials to create free radicals, and combining the free radicals, alone or in combination with other materials, to form the chemical species. An inductively coupled plasma preferably performs such dissociation.