FOCUS RING DRIVING APPARATUS FOR PLASMA ETCHING CHAMBER

摘要

PURPOSE: A focus ring driving apparatus for a plasma etching chamber is provided to be capable of controlling the height of a focus ring for improving the uniformity of a wafer. CONSTITUTION: A focus ring driving apparatus for a plasma etching chamber is provided with a focus ring(34) for holding a wafer loaded on an electrostatic chuck(30) and a focus ring driving part(32) installed at the edge portion of the electrostatic chuck for moving the focus ring up and down. The focus ring driving part includes a servo motor, a switch for outputting a switching signal, a servo motor controller for controlling the position of the focus ring, a servo motor driving part for generating a driving signal of the servo motor, and an encoder.