| 发明名称 |
Amine compounds, resist compositions and patterning process |
| 摘要 |
Novel amine compounds having a nitrogen-containing cyclic structure and a hydrating group such as a hydroxy, ether, ester, carbonyl, carbonate group or lactone ring are useful for use in resist compositions for preventing a resist film from thinning and also for enhancing the resolution and focus margin of resist.
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| 申请公布号 |
US6749988(B2) |
申请公布日期 |
2004.06.15 |
| 申请号 |
US20010994808 |
申请日期 |
2001.11.28 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
HATAKEYAMA JUN;KOBAYASHI TOMOHIRO;WATANABE TAKERU;NAGATA TAKESHI |
| 分类号 |
G03F7/004;G03F7/038;G03F7/039;(IPC1-7):G03C1/73;G03F7/20;G03F7/30 |
主分类号 |
G03F7/004 |
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