| 摘要 |
PURPOSE: A method for manufacturing an LCD(Liquid Crystal Display) are provided to prevent an image badness from generating when driving the LCD by etching the width of an active layer toward the inside of a data bus line. CONSTITUTION: A gate metal film is deposited on a transparent insulation substrate(20) and thereafter the first mask process for forming a gate electrode and a gate bus line by etching is performed. Thereafter, a gate insulation layer(24) is deposited and an active layer(27) and a source/drain metal film are sequentially deposited. In a TFT(Thin Film Transistor) region, the active layer(27) and the source/drain metal film are etched continuously by a wet etching and a dry etching on the basis of a half tone photoresist film pattern. In a data bus line region, a data bus line(23b) is formed by a wet etching and the active layer is etched by a dry etching successively. As a result, a part of the data bus line(23b) and source/drain electrodes(26a,26b) is removed, so that the width of the active layer(27) is wider than that of the data bus line(23b) and source/drain electrodes(26a,26b). A polyimide passivation film(29) is coated on the transparent substrate(20) for protecting devices.
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