发明名称 RADIATION SOURCE, LITHOGRAPHY ARRANGEMENT, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a radiation source that improves the conversion efficiency of electric energy into radiation. <P>SOLUTION: A radiation source unit comprises an anode and a cathode that are configured and arranged to create discharge in a substance in a space between the anode and the cathode to form plasma so as to generate electromagnetic radiation. The liquid may comprises xenon, indium, lithium, tin, or an arbitrary suitable material. In order to improve the conversion efficiency, the radiation source unit is constructed to have low inductance and operated with the minimum of plasma. In order to improve heat dissipation, a liquid circulation system is created in the radiation source space and a wick by using a fluid in both vapor and liquid phases. In order to prevent contamination from entering a lithographic projection apparatus, the radiation source unit is constructed to minimize the generation of contamination, and a trap is employed to capture the contamination without interfering with the emitted radiation. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004165160(A) 申请公布日期 2004.06.10
申请号 JP20030376283 申请日期 2003.09.30
申请人 ASML NETHERLANDS BV 发明人 ZUKAVISHVILI GIVI GEORGIEVITCH;IVANOV VLADIMIR VITAL'EVITCH;KOSHELEV KONSTANTIN NIKOLAEVITCH;KOROB EVGENII DMITREEVITCH;BANINE VADIM YEVGENYEVICH;PAVEL STANISLAVOVICH ANTSIFEROV
分类号 G21K5/00;F28D15/02;G03F7/20;G21K5/02;G21K5/08;H01L21/027;H05G2/00;H05H1/24 主分类号 G21K5/00
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