发明名称 MEASURING METHOD, METHOD AND APPARATUS FOR HOLDING SUBSTRATE, AND ALIGNER
摘要 PROBLEM TO BE SOLVED: To provide a substrate holding apparatus capable of easily acquiring with precision the information regarding a substrate and the shape (planarity) of a holding surface that holds the substrate. SOLUTION: A substrate holder PH holds a photosensitized substrate P, by placing it on a holding surface 1 that holds it. The substrate holder PH comprises a light-transmitting system 67, which is movable relative to a surface PS of the photosensitized substrate P and makes measurement light B irradiated, a light-receiving system 68 which detects a reflected light BB reflected on a rear surface PB facing the surface PS of the photosensitized substrate P, and a controller CONT that detects a contact information between the photosensitized substrate P and the holding surface 1, based on the light quantity of the reflected light BB received by the light-receiving system 68. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004163366(A) 申请公布日期 2004.06.10
申请号 JP20020332185 申请日期 2002.11.15
申请人 NIKON CORP 发明人 HARADA KEIKAI
分类号 G01B11/30;G03F7/20;H01L21/027;H01L21/68;H01L21/683;(IPC1-7):G01B11/30 主分类号 G01B11/30
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