| 摘要 |
PROBLEM TO BE SOLVED: To manufacture a super water-repellent film at a low temperature, without giving an element damage due to charged particles in plasma. SOLUTION: The method for manufacturing a super water-repellent film uses a vacuum ultraviolet-radiation CVD apparatus 100 comprising a vacuum ultraviolet light-producing section 102, a reaction chamber 106, and a window 104 for separating the reaction chamber 106 from the vacuum ultraviolet light-producing section 102. With the use of the apparatus, the method irradiates the inside of the reaction chamber 106 with a vacuum ultraviolet light through the window 104 from a vacuum ultraviolet light-producing section 102, in the presence of plasma having an energy of larger than 0 but smaller than 10 eV and a gas of an organic material in the reaction chamber 106, while keeping a substrate 116 warm by a heat insulation section 118 installed in a support 114, for the purpose of keeping the substrate 116 in such a temperature range as not to damage itself. COPYRIGHT: (C)2004,JPO
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