Supercritical carbon dioxide/chemical formulation for removal of photoresists,申请号AU20030284931-传众专利搜索

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发明名称	Supercritical carbon dioxide/chemical formulation for removal of photoresists
摘要
申请公布号	AU2003284931(A8)	申请公布日期	2004.06.07
申请号	AU20030284931	申请日期	2003.10.27
申请人	ADVANCED TECHNOLOGY MATERIALS, INC.	发明人	ELIODOR G. GHENCIU;THOMAS H. BAUM;MICHAEL B. KORZENSKI;CHONGYING XU
分类号	C11D7/02;C11D7/10;C11D7/32;C11D7/50;G03F7/42;(IPC1-7):B05D1/00;H01L21/00	主分类号	C11D7/02
代理机构		代理人
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