APPARATUS FOR INSPECTING DEFECT ON REAR SURFACE OF WAFER AND SEMICONDUCTOR FABRICATING METHOD USING THE SAME

摘要

PURPOSE: An apparatus for inspecting a defect on the rear surface of a wafer is provided to prevent a local hunting phenomenon and perform the maintenance process on semiconductor fabricating equipment by inspecting whether a defect exists on the rear surface of the wafer before a wafer coated with a photoresist layer is loaded into an exposure apparatus. CONSTITUTION: A wafer holding unit(110) holds a wafer to inspect whether a defect exists on the wafer. A defect detecting unit(120) inspects whether a defect exists on the rear surface of the wafer. A display unit(140) displays whether a defect is detected from the defect detecting unit. A control unit(130) controls the operation of the wafer holding unit, the defect detecting unit and the display unit.