| 摘要 |
PURPOSE: An apparatus for controlling the pressure of a chamber by using a multinozzle ejector is provided to improve productivity and production yield, by decreasing the interval of time for a wet oxidation process of a gallium arsenic wafer by half. CONSTITUTION: Nitrogen and deionized water are supplied from one side of the chamber to the inside of the chamber(C), and a predetermined pressure is supplied to the inside of the chamber from the other side of the chamber. The multinozzle ejector(240) sprays air to supply a uniform pressure to the inside of the chamber, connected to the other side of the chamber and capable of controlling the pressure of the chamber.
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