| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an electron beam emission source with a smaller electron emission angle, having a structure easy to join a nanotube, to provide a manufacturing method of the electron beam emission source, and to provide an electron beam lithography system with a smaller electron beam diameter and capable of exposing a micropattern. <P>SOLUTION: The electron beam emission source has a protrusion 3 with a conductivity on a board 1, and part other than the tip part 3a is covered with an insulator 2, and a carbon nanotube 4 is jointed with the tip part 3a of the protrusion 3. <P>COPYRIGHT: (C)2004,JPO</p> |
