发明名称 SUBSTRATE PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To magnetically disconnect a processing space of a substrate from outside while maintaining advantages of a stage device having a non-contact guide mechanism. SOLUTION: A substrate processing device comprises a vacuum chamber 7 that serves as a processing space wherein the substrate 13 is treated by electron beams 1 or charged particle beams, the stage device 5 for supporting the substrate 13 in the vacuum chamber 7, a movable plate 9 which is connected to the stage device 5 in the vacuum chamber 7 and extended outside the vacuum chamber 7 through openings, a driver which is connected to the movable plate 9 outside the vacuum chamber 7 for moving the movable plate 9, and non-contact seals 27 and hydrostatic bearings for sealing and supporting the movable plate 9 at the openings of the vacuum chamber 7. In the device, the movable plate 9 is constituted of a magnetic material. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004158657(A) 申请公布日期 2004.06.03
申请号 JP20020323291 申请日期 2002.11.07
申请人 EBARA CORP 发明人 SHINOZAKI HIROYUKI;WATANABE KAZUHIDE
分类号 H01J37/20;H01L21/027;H01L21/68;(IPC1-7):H01L21/027 主分类号 H01J37/20
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