发明名称 Method of making gratings and phase masks for fiber grating fabrication
摘要 In accordance with the invention, the fabrication of a grating phase mask is improved by providing a multiple-scan exposure which can provide an accumulated exposure that is effectively phase modulated or modulated rapidly in amplitude. Applicants have determined that exposure scans can be chosen so that each is modulated in amplitude and without modulation in phase, but the accumulated exposure of the multiple scans is modulated in phase and/or modulated in amplitude. The improved method can be used to make phase masks for fabrication of sophisticated fiber gratings such as superstructure gratings.
申请公布号 US2004106050(A1) 申请公布日期 2004.06.03
申请号 US20030701585 申请日期 2003.11.05
申请人 OFS FITEL 发明人 EGGLETON BENJAMIN J.;SUMETSKY MISHA;WESTBROOK PAUL S.
分类号 G02B6/12;G02B5/18;G02B6/02;G03F1/14;G03F7/00;(IPC1-7):G03C5/00;H01S3/00;B05D5/12;G03B27/42;G03F9/00 主分类号 G02B6/12
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