| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition having excellent transparency when using a light source of ≤160 nm wavelength, concretely, of an F<SB>2</SB>excimer laser light (at 157 nm). <P>SOLUTION: The positive resist composition contains: (A) a resin having a specified repeating unit and increasing the solubility with an alkali aqueous solution by the effect of an acid; (B) a compound generating an acid by the effect of active rays or radiation; and (C) a solvent. <P>COPYRIGHT: (C)2004,JPO |
