METHOD AND SYSTEM FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method and a system by which a semiconductor device can be manufactured by making the high-speed evaluation of the manufacturing process of a hyperfine actual circuit pattern possible by utilizing a three-dimensional measuring technique using an optical scatterometric instrument. SOLUTION: In the method, the product of the semiconductor device is manufactured by forming a test pattern and an actual circuit pattern through a prescribed semiconductor manufacturing process. The semiconductor manufacturing process is evaluated with respect to the actual circuit pattern of the product by measuring the feature of the three-dimensional form of the test pattern formed in the product by using the optical scatterometric instrument. COPYRIGHT: (C)2004,JPO