GAS SUPPLY APPARATUS OF SEMICONDUCTOR FABRICATION EQUIPMENT

摘要

PURPOSE: A gas supply apparatus of semiconductor fabrication equipment is provided to enhance the injection efficiency by improving injection pressure of an injection unit. CONSTITUTION: A gas supply apparatus of semiconductor fabrication equipment includes a supply line and an injection unit. The supply line(53a) is used for supplying gas into a process chamber. The injection unit(55a) is installed at the supply line in order to inject the gas into the inside of the chamber. The injection unit injects the gas to all directions on the basis of a termination side of the supply line. The injection unit injects the gas to the four directions at intervals of 90 degrees or the six directions at intervals of 60 degrees or the eight directions at intervals of 45 degrees.