DOUBLE-SIDED SIMULTANEOUS TREATMENT PLASMA SYSTEM USING TWO ELECTRODES HAVING DIFFERENT FREQUENCIES

摘要

PURPOSE: A double-sided simultaneous treatment plasma system is provided to treat two sides at a time by using two electrodes having different frequencies. CONSTITUTION: A chamber(8) of a device capable of reducing voltages is grounded. A plurality of electrodes(4,4',7,7') are arranged on both sides of a material to be treated with an optimal spacing by using a coupling circuit supplied with the first high frequency voltage source(2) having a frequency higher than a few MHz order. The second electrode is arranged with an optimal spacing on an outside of the both sides by using the second voltage source having a frequency in the range between 1KHz and 200KHz. The second voltage source is applied on a push-pull source. Each of the electrodes has a phase opposite to each other. A gas for generating plasma is supplied between the electrodes. Resulting charged particles are accelerated to one another by using the second push-pull voltage source.