发明名称 In-situ source metrology instrument and method of use
摘要 A process of measuring the radiant intensity profile of an effective source of a projection image system that has an effective source, an object plane, an imaging objective, an exit pupil, and an image plane. The improved process consists of selecting at least one field point and a corresponding aperture plane aperture and projecting a plurality of images of the selected field point through the corresponding selected aperture plane aperture at a plurality of various intensities of the effective source. By analyzing the recorded images of the effective source at various intensities it is possible to determine a radiant intensity profile of the image source at the selected field point.
申请公布号 US6741338(B2) 申请公布日期 2004.05.25
申请号 US20010974520 申请日期 2001.10.09
申请人 LITEL INSTRUMENTS 发明人 MCARTHUR BRUCE B.;SMITH ADLAI H.
分类号 G01J9/00;G01M11/02;G03F7/20;(IPC1-7):G01J1/00 主分类号 G01J9/00
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