| 摘要 |
In a solid-state image sensor using a diffraction element to diffract the radiation onto a pixel. The resulting diffraction pattern has a high intensity area at which a majority of the radiation intensity of the entire diffraction pattern is concentrated. In one approach this high intensity area may be positioned to fall incident upon the detecting area of the pixel. The diffraction element may utilize either an aperture or a lens within an opaque element. An associated method for detecting radiation is also disclosed. |
