发明名称 METHOD FOR MANUFACTURING CAPACITIVE ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a capacitive element with which strontium titanate having a high specific dielectric constant can be formed on a polycrystalline lower electrode and oxidation of a barrier metal film is suppressed. <P>SOLUTION: The amorphous strontium titanate film 15a is deposited on the lower electrode 14 formed of polycrystalline Ru (ruthenium). The strontium titanate film 15a is crystallized in atmosphere of inert gas by RTA heat treatment at a temperature of 500&deg;C to 650&deg;C. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004146559(A) 申请公布日期 2004.05.20
申请号 JP20020309281 申请日期 2002.10.24
申请人 ELPIDA MEMORY INC 发明人 NAKANISHI SHIGEHIKO
分类号 H01L27/04;H01L21/00;H01L21/02;H01L21/314;H01L21/316;H01L21/822;H01L21/8242;H01L27/108 主分类号 H01L27/04
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