发明名称 POSITIVE PHOTOSENSITIVE COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a positive photosensitive composition which has a laser beam sensitivity in a near infrared (IR) wavelength region that the sensed part exposed to the laser beam in the near IR wavelength region is made soluble with a developer liquid to unnecessitate a burning process, keeps high sensitivity to realize extremely fine development, obtalns a sharp contour of the edge of a resist image following the irradiated pattern in the exposure, and has excellent latitude in an image formation by development. <P>SOLUTION: The composition comprises an alkali-soluble organic polymer substance having a phenolic hydroxyl group, a photothermal converting dye which absorbs near IR rays from an exposure light source to convert into heat, a cellulose derivative and imidazole silane. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004144946(A) 申请公布日期 2004.05.20
申请号 JP20020308852 申请日期 2002.10.23
申请人 THINK LABORATORY CO LTD 发明人 SATO TSUTOMU;MURATA ATSUSHI
分类号 G03F7/085;G03F7/00;G03F7/004;G03F7/075 主分类号 G03F7/085
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