| 摘要 |
PURPOSE: A method for micromachining photosensitive glass is provided to fabricate various high functional devices by micromachining a photosensitive glass substrate having a predetermined shape. CONSTITUTION: A method for micromachining photosensitive glass comprises the steps of crystallizing a photosensitive glass substrate, which is exposed to ultraviolet ray through a photo mask, converting a shape of the photosensitive glass substrate into a predetermined shape, such as a curved shape, by applying external physical force to the photosensitive glass substrate, and cooling the photosensitive glass substrate. After cooling the photosensitive glass substrate, crystallized portions of the photosensitive glass substrate is selectively etched, thereby forming a micro structure.
|
