发明名称 |
PHOTOSENSITIVE MATERIAL PROCESSING APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To improve a processing apparatus for a photosensitive material, which uses a slot die and to provide the processing apparatus in which fixation and crystallization at a processing liquid applying part are prevented. SOLUTION: The photosensitive material processing apparatus is a processing apparatus which applies a processing liquid dropping from a slit on the photosensitive material by using a slot die comprising at least the slit and a manifold and has a movable plane member capable of slanting to the upstream or downstream side in a processing direction at a position which is separate opposite the tip part of the slit. COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2004144871(A) |
申请公布日期 |
2004.05.20 |
申请号 |
JP20020307930 |
申请日期 |
2002.10.23 |
申请人 |
MITSUBISHI PAPER MILLS LTD |
发明人 |
TAKANO YOSHIKAZU;OTSUKA MASAYOSHI |
分类号 |
G03D5/00;B05B1/04;B05C5/02;B05C11/00;G03D13/00;(IPC1-7):G03D5/00 |
主分类号 |
G03D5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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