发明名称 PHOTOSENSITIVE MATERIAL PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To improve a processing apparatus for a photosensitive material, which uses a slot die and to provide the processing apparatus in which fixation and crystallization at a processing liquid applying part are prevented. SOLUTION: The photosensitive material processing apparatus is a processing apparatus which applies a processing liquid dropping from a slit on the photosensitive material by using a slot die comprising at least the slit and a manifold and has a movable plane member capable of slanting to the upstream or downstream side in a processing direction at a position which is separate opposite the tip part of the slit. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004144871(A) 申请公布日期 2004.05.20
申请号 JP20020307930 申请日期 2002.10.23
申请人 MITSUBISHI PAPER MILLS LTD 发明人 TAKANO YOSHIKAZU;OTSUKA MASAYOSHI
分类号 G03D5/00;B05B1/04;B05C5/02;B05C11/00;G03D13/00;(IPC1-7):G03D5/00 主分类号 G03D5/00
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